Publikations Einzelansicht Titel: Investigation of the electron beam induced transformation of Cu3N-films   Autor(en):   N. Lesch, P. Karduck, R. Cremer und A. von Richthofen   Journal: Fresenius J Anal Chem Jahr: 1998 Band: 361 Seite(n): 604-607 Zusammenfassung: Homogeneous films of metastable Cu3N were deposited on Si-<100> wafers at 90 °C by means of reactive magnetron sputtering ion plating. Under electron bombardment with a focused beam at high current (> 700 nA, 15 keV) these films transform into metallic Cu and N2. The depletion of N was measured quantitatively by EPMA. Structures with a lateral size of 2 µm consisting of metallic copper were written into the Cu3N films. AFM surface scans revealed a vertical growth of the columnar grains of the Cu3N film due to the electron bombardment. Zurück zur Listen Ansicht