Publikations Einzelansicht

Titel: Investigation of the electron beam induced transformation of Cu3N-films
 

Autor(en):
 
N. Lesch, P. Karduck, R. Cremer und A. von Richthofen
 
Journal: Fresenius J Anal Chem
Jahr: 1998
Band: 361
Seite(n): 604-607


Zusammenfassung:
Homogeneous films of metastable Cu3N were deposited on Si-<100> wafers at 90 °C by means of reactive magnetron sputtering ion plating. Under electron bombardment with a focused beam at high current (> 700 nA, 15 keV) these films transform into metallic Cu and N2. The depletion of N was measured quantitatively by EPMA. Structures with a lateral size of 2 µm consisting of metallic copper were written into the Cu3N films. AFM surface scans revealed a vertical growth of the columnar grains of the Cu3N film due to the electron bombardment.

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Publikations Einzelansicht

Titel: Investigation of the electron beam induced transformation of Cu3N-films
 

Autor(en):
 
N. Lesch, P. Karduck, R. Cremer und A. von Richthofen
 
Journal: Fresenius J Anal Chem
Jahr: 1998
Band: 361
Seite(n): 604-607


Zusammenfassung:
Homogeneous films of metastable Cu3N were deposited on Si-<100> wafers at 90 °C by means of reactive magnetron sputtering ion plating. Under electron bombardment with a focused beam at high current (> 700 nA, 15 keV) these films transform into metallic Cu and N2. The depletion of N was measured quantitatively by EPMA. Structures with a lateral size of 2 µm consisting of metallic copper were written into the Cu3N films. AFM surface scans revealed a vertical growth of the columnar grains of the Cu3N film due to the electron bombardment.

Zurück zur Listen Ansicht